Measuring the energy flux at the substrate position during magnetron sputter deposition processes
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4773103
Reference38 articles.
1. Recent progress in thin film processing by magnetron sputtering with plasma diagnostics
2. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
3. Microstructural evolution during film growth
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