The influence of pulse duration and duty cycle on the energy flux to the substrate in high power impulse magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference74 articles.
1. Thermal power at a substrate during ZnO:Al thin film deposition in a planar magnetron sputtering system;Wendt;J. Appl. Phys.,1997
2. A structure zone diagram including plasma-based deposition and ion etching;Anders;Thin Solid Films,2010
3. Biaxial alignment in sputter deposited thin films;Mahieu;Thin Solid Films,2006
4. Sputtered atom transport in high‐current gas discharges: a self‐consistent computer simulation study;Urbassek;J. Vac. Sci. Technol.,1993
5. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings;Thornton;J. Vac. Sci. Technol.,1974
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