Ion energy distributions in a pulsed dual frequency inductively coupled discharge of Ar/CF4 and effect of duty ratio
Author:
Affiliation:
1. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea
2. SKKU Advanced Institute of Nanotechnology(SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea
Funder
Ministry of Knowledge Economy, South Korea
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4928442
Reference35 articles.
1. Extraction of a nearly monoenergetic ion beam using a pulsed plasma
2. Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity
3. Control of ion energy distribution at substrates during plasma processing
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