Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity-Reference-Cited by-同舟云学术

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Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity

Published:2001-09 Issue:5 Volume:19 Page:2425-2432
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Wang S.-B.,Wendt A. E.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1387056

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