Laser studies of the reactivity of SiH with the surface of a depositing film
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.456971
Reference30 articles.
1. Reactive sticking coefficients for silane and disilane on polycrystalline silicon
2. Adsorption kinetics of SiH4, Si2H6 and Si3H8 on the Si(111)-(7×7) surface
3. Kinetics and mechanism of amorphous hydrogenated silicon growth by homogeneous chemical vapor deposition
4. DEPOSITION OF a-Si : H BY HOMOGENEOUS CVD
5. A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion
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