Reactive sticking coefficients for silane and disilane on polycrystalline silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.340982
Reference39 articles.
1. A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor
2. A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion
3. Comparisons between a gas‐phase model of silane chemical vapor deposition and laser‐diagnostic measurements
4. Gas‐phase silicon atoms in silane chemical vapor deposition: Laser‐excited fluorescence measurements and comparisons with model predictions
5. The Kinetics of Silicon Deposition on Silicon by Pyrolysis of Silane
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