DEPOSITION OF a-Si : H BY HOMOGENEOUS CVD
Author:
Publisher
EDP Sciences
Subject
General Engineering
Link
http://jphyscol.journaldephysique.org/10.1051/jphyscol:19814139/pdf
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Thin film technology based on hydrogenated amorphous silicon;Materials Science and Engineering: A;1991-07
2. Laser studies of the reactivity of SiH with the surface of a depositing film;The Journal of Chemical Physics;1989-08-15
3. Properties of intrinsic and doped a‐Si:H deposited by remote plasma enhanced chemical vapor deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1988-05
4. Surface Characterization of Hydrogenated Silicon Powder Made by the Laser-Induced Decomposition of Silane;Advanced Ceramic Materials;1988-05
5. Thin films-preparation, structure and properties. Preparation of photoconductive amorphous Silicon films by chemical deposition.;NIPPON KAGAKU KAISHI;1987
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