Gas Phase Energetics of CN Radicals in Radio Frequency Discharges: Influence on Surface Reaction Probability During Deposition of Carbon Nitride Films
Author:
Affiliation:
1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp100077n
Reference39 articles.
1. Three-dimensional gas temperature measurements in atmospheric pressure microdischarges using Raman scattering
2. Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
3. Determination of electron temperature, atomic fluorine concentration, and gas temperature in inductively coupled fluorocarbon/rare gas plasmas using optical emission spectroscopy
4. CN Surface Interactions and Temperature-Dependent Film Growth During Plasma Deposition of Amorphous, Hydrogenated Carbon Nitride
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