CN Surface Interactions and Temperature-Dependent Film Growth During Plasma Deposition of Amorphous, Hydrogenated Carbon Nitride-Reference-Cited by-同舟云学术

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CN Surface Interactions and Temperature-Dependent Film Growth During Plasma Deposition of Amorphous, Hydrogenated Carbon Nitride

Published:2009-01-12 Issue:5 Volume:113 Page:1963-1971
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Stillahn Joshua M.¹,Fisher Ellen R.¹

Affiliation:

1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp8085655

Reference61 articles.

1. Prediction of New Low Compressibility Solids

2. State of Art and recent trends in bulk carbon nitrides synthesis

3. A review of the preparation of carbon nitride films

4. Tribological Behavior of Amorphous Carbon Nitride Overcoats for Magnetic Thin-Film Rigid Disks

5. Durability and structure of RF sputtered carbon-nitrogen thin film overcoats on rigid disks of magnetic thin film media

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