Nucleation‐limited phase selection during reactions in nickel/amorphous‐silicon multilayer thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345685
Reference15 articles.
1. Structure and growth kinetics of Ni2Si on silicon
2. Influence of the nature of the Si substrate on nickel silicide formed from thin Ni films
3. Anomalous first‐phase formation in rapidly thermal annealed, thin‐layered Si/Ni/Si films
4. Amorphous silicide formation by thermal reaction: A comparison of several metal–silicon systems
5. Transmission electron microscope study of the formation of Ni2Si and NiSi on amorphous silicon
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