Amorphous silicide formation by thermal reaction: A comparison of several metal–silicon systems-Reference-Cited by-同舟云学术

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Amorphous silicide formation by thermal reaction: A comparison of several metal–silicon systems

Published:1989-05 Issue:3 Volume:7 Page:1479-1483
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Holloway Karen,Sinclair Robert,Nathan Menachem

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576081

Cited by 65 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Effects of rapid thermal annealing on the electrical and structural properties of Mo/SiC schottky contacts;Molecular Crystals and Liquid Crystals;2018-12-12

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