Anomalous first‐phase formation in rapidly thermal annealed, thin‐layered Si/Ni/Si films

Author:

Natan Menachem

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 33 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Nickel silicide formation with rapid thermal treatment in the heat balance mode;Doklady of the National Academy of Sciences of Belarus;2021-02-25

2. Low-Temperature Formation of NiSi2Phase in Ni/Si System;Electronics and Communications in Japan;2016-08-12

3. Low-temperature Formation of NiSi2 Phase in Ni/Si System;IEEJ Transactions on Electronics, Information and Systems;2015

4. In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers;Journal of Applied Physics;2009-09-15

5. Characterization of the ternary phase at the Sn/Ni–V joint;Journal of Materials Research;2008-10

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