Transmission electron microscope study of the formation of Ni2Si and NiSi on amorphous silicon-Reference-Cited by-同舟云学术

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Transmission electron microscope study of the formation of Ni2Si and NiSi on amorphous silicon

Published:1987-05-18 Issue:20 Volume:50 Page:1453-1454
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Aboelfotoh M. O.,Tawancy H. M.,d’Heurle F. M.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.97799

Reference12 articles.

1. Amorphous transition phase of NiSi2

2. The Glass Transition Phases in the Formation of PtSi

3. Transmission electron microscope study of the initial stage of formation of Pd2Si and Pt2Si

4. Nucleation‐controlled thin‐film interactions: Some silicides

5. Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds

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1. Low-Temperature Formation of NiSi2Phase in Ni/Si System;Electronics and Communications in Japan;2016-08-12

2. Low-temperature Formation of NiSi₂ Phase in Ni/Si System;IEEJ Transactions on Electronics, Information and Systems;2015

3. Plasma-enhanced chemical vapour deposition growth of carbon nanotubes on different metal underlayers;Nanotechnology;2005-02-12

4. Calorimetric analysis of thin‐film reactions: Experiments and modeling in the nickel/silicon system;Journal of Applied Physics;1994-11

5. Interfacial reactions in Ni/amorphous-Si multilayers;Materials Science and Engineering: A;1994-05

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