Interfacial reactions in Ni/amorphous-Si multilayers
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference17 articles.
1. Silicides for VLSI Applications;Murarka,1983
2. Reaction kinetics of nickel/silicon multilayer films
3. Transmission electron microscope study of the formation of Ni2Si and NiSi on amorphous silicon
4. Nucleation‐limited phase selection during reactions in nickel/amorphous‐silicon multilayer thin films
5. Phase selection in interfacial reaction of Ni/amorphous Si multilayers
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2. Effect of initial composition on phase selection in Ni–Si powder blends processed by mechanical alloying;Materials and Manufacturing Processes;2017-11-20
3. Synthesis of stable and metastable phases in the Ni Si system by mechanical alloying;Powder Technology;2016-11
4. Kinetics of shift of individual interfaces in Ni/Si system during low temperature reactions;Microelectronic Engineering;2015-02
5. Thermal stability of nanocrystalline Ni silicides synthesized by mechanical alloying;Materials Science and Engineering: A;2000-05
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