Reaction kinetics of nickel/silicon multilayer films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99644
Reference11 articles.
1. Mesotaxy: Single‐crystal growth of buried CoSi2layers
2. Structure and growth kinetics of Ni2Si on silicon
3. Influence of the nature of the Si substrate on nickel silicide formed from thin Ni films
4. Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds
5. Heat of crystallization and melting point of amorphous silicon
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