Impact of nanosecond laser energy density on the C40-TiSi2 formation and C54-TiSi2 transformation temperature-Reference-Cited by-同舟云学术

Impact of nanosecond laser energy density on the C40-TiSi2 formation and C54-TiSi2 transformation temperature

Published:2020-08 Issue:8 Volume:128 Page:085305
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Esposito L.¹²³^ORCID,Kerdilès S.²^ORCID,Gregoire M.¹,Benigni P.³,Dabertrand K.¹,Mattei J.-G.¹,Mangelinck D.³

Affiliation:

1. STMicroelectronics, 850, rue Jean Monnet, 38926, Crolles Cedex, France

2. Université Grenoble Alpes, CEA-LETI, F-38000 Grenoble, France

3. Institut Matériaux Microélectronique Nanosciences de Provence, IM2NP-CNRS, Aix-Marseille Université, Service 142, Faculté de Saint Jérôme, 13397 Marseille Cedex 20, France

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0016091

Reference60 articles.

1. Ultra Low Contact Resistivities for CMOS Beyond 10-nm Node

2. Improved Current Drivability for Sub-20-nm N-FinFETs by Ge Pre-Amorphization in Contact With Reverse Retrograde Profile

3. The Future Of Silicide For CMOS Contacts

4. Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies

5. Silicides for integrated circuits: TiSi2 CoSi2

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermodynamic Study of High-Purity TiSi2 Prepared by Directional Solidification;Metallurgical and Materials Transactions B;2024-07-08

2. C54-TiSi2 formation using nanosecond laser annealing of A-Si/Ti/A-Si stacks;Thin Solid Films;2024-06

3. Process optimization of titanium self-aligned silicide formation through evaluation of sheet resistance by design of experiment methodology;Solid-State Electronics;2024-05

4. Role of angular velocity on Marangoni convection shifting, heat accumulation, and microstructure evolution using laser directed energy deposition;Journal of Applied Physics;2024-02-06

5. Influence of Si surface preparation on CoSi2 formation and agglomeration;Materials Science in Semiconductor Processing;2023-08