Characterization of focused-ion-beam-induced damage in n-type silicon using Schottky contact
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2195109
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1. A review of focused ion beam applications in microsystem technology
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4. Transmission Electron Microscopy Studies of the Nanoscale Structure and Chemistry of Pt50Ru50 Electrocatalysts
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