Time-resolved measurements of Cl2 density in high-density plasmas and application
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2171768
Reference15 articles.
1. Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias
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3. Plasma etching of AlN/AlGaInN superlattices for device fabrication
4. Temperature-dependent Cl2/Ar plasma etching of bulk single-crystal ZnO
5. Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl2 and Cl number densities
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