Absolute CF2 density and gas temperature measurements by absorption spectroscopy in dual-frequency capacitively coupled CF4/Ar plasmas-Reference-Cited by-同舟云学术

Absolute CF2 density and gas temperature measurements by absorption spectroscopy in dual-frequency capacitively coupled CF4/Ar plasmas

Published:2014-10 Issue:10 Volume:21 Page:103501
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Liu Wen-Yao¹²,Xu Yong¹²,Liu Yong-Xin¹,Peng Fei¹²,Gong Fa-Ping¹²,Li Xiao-Song¹²,Zhu Ai-Min¹²,Wang You-Nian¹

Affiliation:

1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

2. Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, China

Funder

Major National Science and Technology Project of China

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4897172

Reference56 articles.

1. Principles of Plasma Discharges and Materials Processing

2. Time resolved measurements of the CF2rotational temperature in pulsed fluorocarbon rf plasmas

3. Sources and sinks of CF and CF2 in a cc-RF CF4-plasma under various conditions

4. Absolute number density and kinetic analysis of the CF radical in pulsed CF4+ H2radio-frequency plasmas

5. Absolute fluorine atom concentrations in fluorocarbon plasmas determined from CF2 loss kinetics

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