Sources and sinks of CF and CF2 in a cc-RF CF4-plasma under various conditions
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference31 articles.
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3. Selective and deep plasma etching of SiO[sub 2]: Comparison between different fluorocarbon gases (CF[sub 4], C[sub 2]F[sub 6], CHF[sub 3]) mixed with CH[sub 4] or H[sub 2] and influence of the residence time
4. Quantitative Laser-Induced Fluorescence Spectroscopy of the CF A2Σ+−X2Π Transition: Electronic Transition Dipole Moment Function and Predissociation
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