Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl2 and Cl number densities
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1321777
Reference30 articles.
1. Percent dissociation of Cl2 in inductively coupled, chlorine-containing plasmas
2. Spatially Averaged (Global) Model of Time Modulated High Density Chlorine Plasmas
3. Two-dimensional simulation of polysilicon etching with chlorine in a high density plasma reactor
4. Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling
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