Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling
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Published:1994-11
Issue:6
Volume:12
Page:3118
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Ventzek Peter L. G.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
136 articles.
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