Surface-confined activation of ultra low-k dielectrics in CO2 plasma
Author:
Affiliation:
1. imec, Kapeldreef 75, B-3001 Leuven, Belgium
2. Department of Chemistry, KU Leuven, 3001 Heverlee, Belgium
3. Skobeltsyn Institute of Nuclear Physics, Moscow State University, SINP MSU, 119991 Moscow, Russia
Funder
Russian Science Foundation (RSF)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4955021
Reference29 articles.
1. Low dielectric constant materials: challenges of plasma damage
2. Low Dielectric Constant Materials
3. Low dielectric constant materials for microelectronics
4. The use of atomic layer deposition in advanced nanopatterning
5. The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Helium electron beam rf plasma for low-k surface functionalization;Journal of Vacuum Science & Technology B;2022-12
2. Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β-Diketonate Precursors;Chemistry of Materials;2022-09-05
3. Non‐self‐sustained electron beam RF‐generated plasma in application for functional surface pretreatment;Plasma Processes and Polymers;2021-05-14
4. Damage to porous SiCOH low-k dielectrics by O, N and F atoms at lowered temperatures;Journal of Physics D: Applied Physics;2020-02-24
5. Use of a Thermally Degradable Chemical Vapor Deposited Polymer Film for Low Damage Plasma Processing of Highly Porous Dielectrics;ACS Applied Electronic Materials;2019-11-19
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3