Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2952033
Reference38 articles.
1. EUV lithography
2. High power extreme ultra-violet (EUV) light sources for future lithography
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4. LPP EUV source development for HVM
5. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas
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1. Efficient photo-dissociation-induced production of hydrogen radicals using vacuum ultraviolet light from a laser-produced plasma;Applied Physics Letters;2024-01-01
2. Radiation of extreme ultraviolet source and out-of-band from laser-irradiated low-density SnO<sub>2</sub> target;Acta Physica Sinica;2023
3. The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range;AIP Advances;2021-12-01
4. Time-resolved spatial profiles of electron density and temperature in hydrogen plasmas induced by radiation from laser-produced tin plasmas for extreme ultraviolet lithography light sources;Japanese Journal of Applied Physics;2021-05-14
5. Energy levels, transition data and collisional excitation cross-section of Sn3+ and Sn4+ ions;Journal of Electron Spectroscopy and Related Phenomena;2020-10
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