Time-resolved spatial profiles of electron density and temperature in hydrogen plasmas induced by radiation from laser-produced tin plasmas for extreme ultraviolet lithography light sources-Reference-Cited by-同舟云学术

Time-resolved spatial profiles of electron density and temperature in hydrogen plasmas induced by radiation from laser-produced tin plasmas for extreme ultraviolet lithography light sources

Published:2021-05-14 Issue:6 Volume:60 Page:066002
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kouge Kouichiro,Tomita Kentaro,Hotta Junya,Pan Yiming,Tomuro Hiroaki,Morita Masayuki,Yanagida Tatsuya,Uchino Kiichiro,Yamamoto Naoji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

https://iopscience.iop.org/article/10.35848/1347-4065/abfadc/pdf

Reference37 articles.

1. THE STATE-OF-THE-ART OF ArF EXCIMER LASER LITHOGRAPHY

2. High-NA ArF lithography for 70-nm technologies

3. High-repetition-rate (6kHz) and long-pulse-duration (50ns) ArF excimer laser for sub-65nm lithography

4. Performance results of laser-produced plasma test and prototype light sources for EUV lithography

5. Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

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1. Absolute density measurement of hydrogen radicals in XUV induced plasma for tin contamination cleaning via laser-induced fluorescence;Applied Physics Letters;2024-04-08

2. Feasibility study on reactive ion etching occurrence in EUV-induced photoionized hydrogen plasmas based on electron temperature and electron density measurements;Japanese Journal of Applied Physics;2022-04-22