High-repetition-rate (6kHz) and long-pulse-duration (50ns) ArF excimer laser for sub-65nm lithography
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2182744
Reference11 articles.
1. Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography
2. High-repetition-rate ArF excimer laser for 193-nm lithography
3. Performance of very high repetition rate ArF lasers
4. Prospects for very high repetition rate lasers for microlithography
5. Development of next generation excimer lasers for industrial applications
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