Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1989441
Reference12 articles.
1. Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development
2. Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser
3. Spectral characterization of EUV radiation emitted from a laser-irradiated gas puff target
4. Spatial characterization of extreme ultraviolet plasmas generated by laser excitation of xenon gas targets
5. A liquid-xenon-jet laser-plasma x-ray and EUV source
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