Enhancement of Sn plasma EUV emission by double-sided laser illumination
Author:
Affiliation:
1. L2X Labs 1 , 75 Brodezki rd., Jerusalem 9190401, Israel
2. Racah Institute of Physics, The Hebrew University of Jerusalem 2 , Jerusalem 9190401, Israel
Abstract
Funder
Israel Innovation Authority, Track 46
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/5.0174503/18212208/204104_1_5.0174503.pdf
Reference18 articles.
1. Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
2. Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W
3. EUV light source for high-NA and low-NA lithography
4. Using L-shell x-ray spectra to determine conditions of non-local thermal dynamic equilibrium plasmas
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