Extreme ultraviolet lithography: overview and development status-Reference-Cited by-同舟云学术

Extreme ultraviolet lithography: overview and development status

Published:2005-01-01 Issue:1 Volume:4 Page:011006
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Silverman Peter J.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. W. D. Domke et al., “Resist characterization for EUV-lithography,” 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/Belgium, Sept. 2003.

2. K. A. Goldberg et al., “VNL research in interferometry for EUV optics,” 1st Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Dallas/Texas, Oct. 2002.

3. C. W. Gwyn, “EUV lithography in perspective,” 2nd Intl. Extreme Ultra-Violet Lithography (EUVL) Symp., Antwerp/Belgium, Sept. 2003.

4. Soft x-ray reduction lithography using multilayer mirrors

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