Development of a spatially controllable chemical vapor deposition reactor with combinatorial processing capabilities
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1906183
Reference23 articles.
1. Flow visualization studies for optimization of OMVPE reactor design
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3. A Mathematical Model for LPCVD in a Single Wafer Reactor
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