Flow visualization studies for optimization of OMVPE reactor design
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference12 articles.
1. Flow Visualization;Merzkirch,1974
2. A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal Reactor
3. Gas Flow Pattern and Mass Transfer Analysis in a Horizontal Flow Reactor for Chemical Vapor Deposition
4. The chemistry and transport phenomena of chemical vapor deposition of silicon from SiCl4
5. Hydrodynamic description of CVD processes
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