Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide-Reference-Cited by-同舟云学术

Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide

Published:2015-06-10 Issue:7 Volume:17 Page:413-420
ISSN:2156-8952
Container-title:ACS Combinatorial Science
language:en
Short-container-title:ACS Comb. Sci.

Author:

Reinke Michael¹²,Ponomarev Evgeniy²,Kuzminykh Yury¹²,Hoffmann Patrik¹²

Affiliation:

1. Laboratory for Advanced Materials Processing, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland

2. Laboratory for Photonic Materials and Characterization, Ecole Polytechnique Fédérale de Lausanne, Station 17, CH-1015 Lausanne, Switzerland

Funder

Schweizerische Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Publisher

American Chemical Society (ACS)

Subject

General Chemistry,General Medicine

Link

https://pubs.acs.org/doi/pdf/10.1021/acscombsci.5b00040

Reference24 articles.

1. Titanium Dioxide Nanomaterials: Synthesis, Properties, Modifications, and Applications

2. TiO2 photocatalysis and related surface phenomena

3. Applications of high throughput (combinatorial) methodologies to electronic, magnetic, optical, and energy-related materials

4. High throughput thin film materials science

5. Combinatorial Atmospheric Pressure CVD of a Composite TiO2/SnO2Thin Film

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