Combinatorial Atmospheric Pressure CVD of a Composite TiO2/SnO2Thin Film-Reference-Cited by-同舟云学术

Combinatorial Atmospheric Pressure CVD of a Composite TiO2/SnO2Thin Film

Published:2014-02-21 Issue:1-2-3 Volume:20 Page:69-79
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Sathasivam Sanjayan¹,Kafizas Andreas¹,Ponja Sapna¹,Chadwick Nicholas¹,Bhachu Davinder S.¹,Bawaked Salem M.²,Obaid Abdullah Y.²,Al-Thabaiti Shaeel²,Basahel Sulaiman N.²,Carmalt Claire J.¹,Parkin Ivan P.¹

Affiliation:

1. Materials Chemistry Research Centre, Department of Chemistry; University College London; 20 Gordon Street London WC1H 0AJ (U.K.)

2. Chemistry Department; King Abdulaziz University; Abdullah Sulayman Jeddah 22254 (Saudi Arabia)

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference39 articles.

1. An overview of semiconductor photocatalysis

2. TiO2 photocatalysis and related surface phenomena

3. Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of niobium doped anatase; effect of niobium on the conductivity and photocatalytic activity

4. An investigation into the effect of thickness of titanium dioxide and gold–silver nanoparticle titanium dioxide composite thin-films on photocatalytic activity and photo-induced oxygen production in a sacrificial system

5. The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating substitutional/interstitial N-doped anatase TiO2 thin-film; UVA and visible light photocatalytic activities

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