Environment and baking influence on charge retention on silicon nitride charge trap layers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3678455
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1. Temperature effects on metal-alumina-nitride-oxide-silicon memory operations
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4. High-resolution imaging of contact potential difference with ultrahigh vacuum noncontact atomic force microscope
5. Localized charge injection in SiO2 films containing silicon nanocrystals
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