Electron density modulation in an asymmetric bipolar pulsed dc magnetron discharge
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2783980
Reference32 articles.
1. A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge
2. Different pulse techniques for stationary reactive sputtering with double ring magnetron
3. Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputtering
4. Pulsed dc magnetron discharge for high-rate sputtering of thin films
5. Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge
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