Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge-Reference-Cited by-同舟云学术

Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge

Published:2016-09 Issue:5 Volume:34 Page:051302
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sirse Nishant¹,Mishra Anurag²,Yeom Geun Y.³,Ellingboe Albert R.⁴

Affiliation:

1. Plasma Research Laboratory, School of Physical Sciences, Dublin City University, Dublin 9, Ireland

2. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea

3. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea and SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeunggi-do 440-746, South Korea

4. Plasma Research Laboratory, School of Physical Sciences, Dublin City University, Dublin 9, Ireland and Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea

Funder

Enterprise Ireland

Korea Institute for Advancement of Technology (KIAT)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4959844

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