Experimental and numerical investigations of the characteristics of electron density in O2/Ar pulsed planar-coil-driven inductively coupled plasmas
Author:
Affiliation:
1. School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China
2. School of Physics, Xi'an Jiaotong University, Xi'an 710049, China
3. School of Physics, Dalian University of Technology, Dalian 116024, China
Funder
National Natural Science Foundation of China
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0049823
Reference40 articles.
1. Pulsed high-density plasmas for advanced dry etching processes
2. Pulsed plasma etching for semiconductor manufacturing
3. Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl2plasmas and potential applications in plasma etching
4. Pulsed inductively coupled plasmas as a method to recoup uniformity: Three-dimensional modeling study
5. Dynamics of pulsed reactive RF discharges in response to thin film deposition
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