Pulsed dc magnetron discharge for high-rate sputtering of thin films-Reference-Cited by-同舟云学术

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Pulsed dc magnetron discharge for high-rate sputtering of thin films

Published:2001-03 Issue:2 Volume:19 Page:420-424
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Musil Jindřich,Leština Jan,Vlček Jaroslav,Tölg Tomáš

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1339018

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