A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference38 articles.
1. Asymmetric bipolar pulsed power: a new power technology
2. Pulsed magnetron sputter technology
3. Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputtering
4. The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge
5. Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma
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