Charge transport and trapping phenomena in off‐stoichiometric silicon dioxide films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.331806
Reference36 articles.
1. Study of charge trapping as a degradation mechanism in electrically alterable read‐only memories
2. Photoemission of Electrons from Silicon into Silicon Dioxide
3. Electrochemical Charging of Thermal SiO2 Films by Injected Electron Currents
4. The effects of water on oxide and interface trapped charge generation in thermal SiO2films
5. Characterization of electron traps in SiO2as influenced by processing parameters
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