Bulk‐quality bipolar transistors fabricated in low‐temperature (Tdep=800 °C) epitaxial silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.97850
Reference4 articles.
1. Low‐temperature silicon epitaxy using low pressure chemical vapor deposition with and without plasma enhancement
2. Low‐temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition
3. Bipolar transistor fabrication in low-temperature (745°C) ultra-low-pressure chemical-vapor-deposited epitaxial silicon
4. The effect of doping on the formation of swirl defects in dislocation-free czochralski-grown silicon crystals
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Electrical characterization of junctions and bipolar transistors formed with in situ doped low-temperature (800 degrees C) epitaxial silicon;IEEE Transactions on Electron Devices;1991
2. Etching Selectivity of SiF4 and H2 Plasmas for c-Si, a-Si:H and SiO2;MRS Proceedings;1990
3. Chemical Vapor Deposition of Epitaxial Silicon from Silane at Low Temperatures: I . Very Low Pressure Deposition;Journal of The Electrochemical Society;1989-08-01
4. Fabrication and characterization of bipolar transistors with in-situ doped low-temperature (800 degrees C) epitaxial silicon;IEEE Electron Device Letters;1989-08
5. Formation of low‐temperature Al/n‐Si Schottky contacts using a partially ionized beam deposition technique;Applied Physics Letters;1988-09-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3