Low‐temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96673
Reference9 articles.
1. Low Pressure Silicon Epitaxy
2. Recent advances in silicon epitaxy and its application to high performance integrated circuits
3. Low-Temperature Silicon Epitaxy
4. Interaction of H 2 O with Si(111) and (100): Critical Conditions for the Growth of
5. Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2
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