Native oxides on Si surfaces of deep‐submicron contact‐hole bottoms
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.358568
Reference10 articles.
1. Surface Damage on Si Substrates Caused by Reactive Sputter Etching
2. Summary Abstract: Reactive ion‐etching‐related Si surface residues and subsurface disorder
3. Reactive ion etching related Si surface residues and subsurface damage: Their relationship to fundamental etching mechanisms
4. Transmission electron microscope study of lattice damage and polymer coating formed after reactive ion etching of SiO2
5. Direct analysis of contamination in submicron contact holes by thermal desorption spectroscopy
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