On the maximum conversion efficiency into the 13.5-nm extreme ultraviolet emission under a steady-state laser ablation of tin microspheres
Author:
Affiliation:
1. Keldysh Institute of Applied Mathematics, Moscow, Russia and RnD-ISAN/EUV Labs, Moscow, Troitsk, Russia
Funder
Russian Science Foundation (RSF)
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4960684
Reference32 articles.
1. EUV Sources for Lithography
2. Physical processes in EUV sources for microlithography
3. Ultimate Efficiency of Extreme Ultraviolet Radiation from a Laser-Produced Plasma
4. Conversion efficiency of a laser-produced Sn plasma at 13.5 nm, simulated with a one-dimensional hydrodynamic model and treated as a multi-component blackbody
5. Conversion efficiency of extreme ultraviolet radiation in laser-produced plasmas
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