Review of the 1st EUV Light Sources Code Comparison Workshop

Author:

Sheil John12ORCID,Versolato Oscar12,Bakshi Vivek3,Scott Howard4

Affiliation:

1. Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands

2. Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit Amsterdam, De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands

3. EUV Litho, Inc., 10202 Wommack Road, Austin, TX 78748, USA

4. Lawrence Livermore National Laboratory, Livermore, CA 94551, USA

Abstract

We review the results of the 1st Extreme Ultraviolet (EUV) Light Sources Code Comparison Workshop. The goal of this workshop was to provide a platform for specialists in EUV light source plasma modeling to benchmark and validate their numerical codes using well-defined case studies. Detailed consideration of a plethora of atomic collisional and radiative processes is required for modeling EUV light source plasmas. Eight institutions spanning four countries contributed data to the workshop. Two topics were addressed, namely (i) the atomic kinetics and radiative properties of tin plasmas under EUV-generating conditions and (ii) laser absorption in a fully ionized, one-dimensional hydrogen plasma. In this paper, we summarize the key findings of the workshop and outline plans for future iterations of the code comparison activity.

Funder

U.S. Department of Energy

Publisher

MDPI AG

Subject

Condensed Matter Physics,Nuclear and High Energy Physics,Atomic and Molecular Physics, and Optics

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