Properties and photovoltaic applications of microcrystalline silicon films prepared by rf reactive sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336145
Reference18 articles.
1. Polycrystalline silicon films deposited in a glow discharge at temperatures below 250 °C
2. Lattice dilatation of small silicon crystallites - implications for amorphous silicon
3. Optical properties and transport in microcrystalline silicon prepared at temperatures below 400 °C
4. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
5. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
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