Polycrystalline silicon films deposited in a glow discharge at temperatures below 250 °C
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91416
Reference9 articles.
1. Heterogeneous Reactions in Non-Isothermal Low Pressure Plasmas: Preparative Aspects and Applications
2. The preparation of thin layers of Ge and Si by chemical hydrogen plasma transport
3. Recativity of solid silicon with hydrogen under conditions of a low pressure plasma
4. Quantitative analysis of hydrogen in glow discharge amorphous silicon
5. Quantitative analysis of hydrogen in glow discharge amorphous silicon
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