Farewell to Stan Vepřek, Founding Editor of Plasma Chemistry and Plasma Processing-Reference-Cited by-同舟云学术

Farewell to Stan Vepřek, Founding Editor of Plasma Chemistry and Plasma Processing

Published:2016-12-28 Issue:1 Volume:37 Page:1-4
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Murphy Anthony B.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-016-9780-8.pdf

Reference30 articles.

1. Stirand O, Veprek S (1964) Die Spektralanalyse der stehenden Schichten im Plasma der positiven Säule der Niederdruckentladung in Wasserstoff. Czech J Phys 14(9):690–697

2. Veprek S (1972) Chemical evaporation and deposition of solids in a nonisothermal plasma; chemical transport of carbon. J Cryst Growth 17(1):101–116

3. Veprek S (1973) Transport of carbon in nonisothermal low-pressure nitrogen plasma. Z Phys Chem 86(1–2):95–107

4. Veprek S, Brendel C, Schäfer H (1971) Chemischer transport im nichtisothermen Plasma; Bildung von AlN- und TiN-Kristallen. J Cryst Growth 9(1):266–272

5. Veprek S (1980) Application of low pressure plasmas in materials science—especially CVD. In: Kaldis E (ed) Current topics in materials science, vol 4. North-Holland, Amsterdam, p 151

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