Growth, structural and vibrational properties of hydrogenated nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering technique at room temperature-Reference-Cited by-同舟云学术

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Growth, structural and vibrational properties of hydrogenated nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering technique at room temperature

Published:2023-03 Issue: Volume:768 Page:139721
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Sönmez Ayşe^ORCID,Sezgin Nagihan^ORCID,Tuna Öcal^ORCID,Öztürk Sibel Tokdemir,Öztürk Osman^ORCID,Karabulut Mevlut^ORCID,Seyidov MirHasan Yu^ORCID

Funder

Gebze Teknik Üniversitesi

Türkiye Bilimsel ve Teknolojik Araştırma Kurumu

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference74 articles.

1. Device Applications of Silicon Nanocrystals and Nanostructures;Koshida,2009

2. Nanoscale Silicon Devices;Oda,2016

3. Silicon Nanocrystals. Fundamentals, Synthesis and Applications;Pavesi,2010

4. Nanocrystalline silicon thin films prepared by radiofrequency magnetron sputtering;Gonçalves;Thin Solid Films,2002

5. Silicon Nanomaterials Sourcebook;Sattler,2017

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation structural heterogeneities in hydrogenated nanocrystalline silicon thin films from argon-diluted silane dusty plasma PECVD;Vacuum;2024-11

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