Molecular dynamics simulations of Ar+-induced transport of fluorine through fluorocarbon films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1644338
Reference9 articles.
1. Fluorocarbon high‐density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3
2. Control of surface reactions in high-performance SiO[sub 2] etching
3. Effect of radio frequency bias power on SiO[sub 2] feature etching in inductively coupled fluorocarbon plasmas
4. Fluorocarbon-based plasma etching of SiO[sub 2]: Comparison of C[sub 4]F[sub 6]/Ar and C[sub 4]F[sub 8]/Ar discharges
5. Molecular dynamics simulations of Si etching by energetic CF3+
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